LRC Develop pane slows after macOS Sequoia update
After upgrading to macOS Sequoia (15.1.1) I'm experiencing slows in LRC (14.0.1), particularly in the Develop pane with masks (esp. subject detection) and Remove tools. I have a Mac Mini M2 Pro w 32GB RAM. Original files (CRAW) are stored on an SSD (W/R = 2300/2200). Switch Graphics Processor between Auto and Custom makes no difference. Any hints to improve and return performance to previous levels are most welcome.
[moving from bugs to discussions according to the community rules - Mod.]
